Kundu , Sandip <br/><br/>
Nanoscale CMOS VLSI circuits :  design for manufacturability / 
 Nanoscale complementary metal oxide semiconductor very large-scale integration circuits 
[by] : Sandip Kundu , Aswin Sreedhar 
 - New York :  McGraw-Hill ,  ©2010 
 - xv , 296 pages :  illustrations ;  24 cm. 
<br/><br/>Includes bibliographical references and index 
<br/><br/>Semiconductor manufacturing -- Process and device variability : analysis and modeling -- Manufacturing-aware physical design closure -- Metrology, manufacturing defects, and defect extraction -- Defect impact modeling and yield improvement techniques -- Physical design and reliability -- Design for manufacturability : tools and methodologies. 
<br/><br/><label>ISBN: </label>9780071635196 (alk. paper) 007163519X (alk. paper) 
<br/><br/><label>LCCN: </label>2010022678 
<br/><br/><label>Nat. Bib. No.: </label>GBB011406  bnb 
<br/><br/><label>Nat. Bib. Agency Control No.: </label>015478365  Uk 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Metal oxide semiconductors, Complementary--Design and construction<br/>Integrated circuits--Very large scale integration--Design and construction<br/>Nanoelectronics
<br/><br/><label>LC Class. No.: </label>TK7871.99.M44  / K84 2010